A new approach to fabricating high density nanoarrays by nanocontact printing

The authors introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high density (number of features per unit area) fashion with a feature size as low as 30nm and period of 100nm. Sub-500nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. They also demonstrate that they can image a nanoarray labeled by streptavidin by atomic force microscope.