纳米压印光刻
材料科学
纵横比(航空)
模具
沟槽(工程)
聚合物
变形(气象学)
复合材料
制作
纳米光刻
平版印刷术
抵抗
光电子学
冶金
病理
医学
替代医学
图层(电子)
作者
Yoshihiko Hirai,Teruko Konishi,Takashi Yoshikawa,Satoshi Yoshida
出处
期刊:Journal of vacuum science & technology
[American Vacuum Society]
日期:2004-11-01
卷期号:22 (6): 3288-3293
被引量:162
摘要
A polymer deformation process is studied by numerical simulations and the results are compared with the related experimental results in nanoimprint lithography. The imprint pressures required for successful imprinting and the filling rate into the mold grooves are studied as the aspect ratio of the pattern, initial thickness of the polymer, and the duty ratio of the pattern are changed. The required pressure increases not only for high aspect ratio pattern but also low aspect ratio pattern. Also, the pressure increases when the initial thickness of the polymer decreases to less than about two times that of the groove depth of the mold. These results are explained by the deformation mechanism of the polymer and agree well with the related experimental results. Based on these theoretical and experimental studies, fabrication of a high aspect ratio pattern having 100 nm width and 860 nm height is successfully demonstrated using thick polymer by nanoimprint lithography.
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