Based on bombardment effect Ec11 of sputtered neutral atoms acted on substrate surface micro-area and bombardment effect Ec22 of bombardment ions acted on substrate surface micro-area,the structure zone model of pure Cr films relating to the magnetron sputtering system was established.The results show that higher ion density can significantly influence the structure of the growing film and enhance the formation of density film at relatively low temperature in the magnetron sputtering system.