硅醇
材料科学
吸附
无定形固体
分子
纳米结构
化学工程
纳米技术
二氧化硅
分子动力学
半导体
硅
化学物理
有机化学
复合材料
化学
光电子学
计算化学
催化作用
工程类
作者
Masayoshi Takayanagi,Naozumi Fujiwara,Ryuichi Seki,Masanobu Sato,Yukihiro Okuno
标识
DOI:10.1149/2162-8777/acec0e
摘要
As the semiconductor industry relentlessly reduces device sizes, efficient and precise cleaning processes have become increasingly critical to address challenges such as nanostructure stiction. Gaining insight into the molecular behavior of water and isopropyl alcohol (IPA) on silicon dioxide (SiO 2 ) surfaces is essential for controlling semiconductor wet cleaning processes. This study investigated the interactions between these liquids and SiO 2 surfaces. Using molecular dynamics (MD) simulations, we examined the adsorption behavior of water and IPA molecules on both amorphous and crystalline SiO 2 (a-SiO 2 and c-SiO 2 ) surfaces. Our findings reveal a preferential adsorption of water molecules on a-SiO 2 surfaces compared to c-SiO 2 . This preference can be ascribed to the irregularity of the a-SiO 2 surface, which results in the presence of silanol groups that remain inaccessible to the liquid molecules. In contrast, the c-SiO 2 surface exhibits a more uniform and accessible structure. This study not only imparts crucial insights into the molecular behavior of water and IPA on SiO 2 surfaces but also provides valuable information for future enhancements and optimization of semiconductor wet surface preparation, cleaning, etching and drying.
科研通智能强力驱动
Strongly Powered by AbleSci AI