与非门
逻辑门
NOR门
材料科学
NMOS逻辑
光电子学
非逻辑
与非门逻辑
电子线路
等效门电路
和或反转
电子工程
电气工程
和大门
通流晶体管逻辑
晶体管
电压
数字电子学
工程类
栅氧化层
作者
V.D. Juncu,Ingmar Kallfass,Raymond Sloan,J.V. Hatfield
出处
期刊:Electronics Letters
[Institution of Engineering and Technology]
日期:2004-06-10
卷期号:40 (12): 772-774
被引量:2
摘要
The behaviour of two fabricated logic gates using n-type Si/SiGe MODFETs is reported. S-parameter measurements show that the voltage separation between states at 20 GHz is 15 dB for the NAND gate and 8 dB for the NOR gate. The measured DC levels of the outputs allow the possibility of cascading the gates for use in more complex circuits.
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