小学生
光学
狭缝
倾斜(摄像机)
偏移量(计算机科学)
入学学生
重心
瞳孔功能
计算机科学
不对称
物理
扫描仪
十字线
平版印刷术
计算机视觉
薄脆饼
光电子学
数学
量子力学
几何学
经济
管理
程序设计语言
作者
Jong Hyun Jang,ByeongSoo Lee,Yongjoon Kang,Chansam Chang,Jeong-Heung Kong,Young Ha Kim,Wim Bouman,Roelof de Graaf,Stefan Weichselbaum,Richard Droste,W.P. de Boeij,Bart van Bussel,Patrick Neefs,A.J. Rijke
摘要
Adjustment and control of the illumination pupil asymmetry is relevant for wafer alignment and overlay of lithography tools. Pupil asymmetries can cause a tilt in aerial image (Aerial Image Tilt, or AIT). This AIT, combined with a focus offset, leads to a horizontal image shift. Pupil asymmetries can be related to a shift of the entire illumination pupil (geometrical telecentricity) caused by illuminator misalign. Another type of pupil asymmetry is energetic imbalance (quantified by pupil Center of Gravity, COG). The scanner can show pupil variation across the exposure slit. In general the COG at the edge of the slit is often worse than in the center part of the slit. Recently, ASML has released the NXT:1980Di that is equipped with an enhanced illuminator to improve pupil COG variation across the slit. In this paper we explore the performance of this scanner system and show that the AIT variation across the slit is also reduced significantly.
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