Optical Isolator with Si Guiding Layer Fabricated by Photosensitive Adhesive Bonding

An optical isolator employing a nonreciprocal guided-radiation mode conversion is described. The optical isolator composes of a magneto-optic waveguide with a Si guiding layer, which can be realized by photosensitive adhesive bonding. The optical isolator was designed at a wavelength of 1.55 μm. Relationship of waveguide parameters was clarified for isolator operation. Dependence of the thickness of an adhesive layer was investigated for the design of the optical isolator.