Ultrasonic‐assisted mist chemical vapor deposition of II‐oxide and related oxide compounds

Abstract Basic concepts of ultrasonic‐assisted mist chemical vapor deposition (CVD), and its applications to the fabrication of II‐oxide and related oxide films are described. Fairly good thin film properties and device performance, compared to those achieved by conventional vacuum‐based processes, encourage the mist CVD as a simple, inexpensive, energy‐saving and non‐vacuum process, opening new and wide application of oxide materials for novel devices supporting the future environment. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)