材料科学
氮化物
微电子
外延
纳米技术
基质(水族馆)
氮化镓
半导体
光电子学
工程物理
图层(电子)
海洋学
地质学
工程类
作者
Yu Xu,Jianfeng Wang,Bing Cao,Ke Xu
出处
期刊:Chinese Physics B
[IOP Publishing]
日期:2022-09-15
卷期号:31 (11): 117702-117702
被引量:4
标识
DOI:10.1088/1674-1056/ac921f
摘要
III-nitride semiconductor materials have excellent optoelectronic properties, mechanical properties, and chemical stability, which have important applications in the field of optoelectronics and microelectronics. Two-dimensional (2D) materials have been widely focused in recent years due to their peculiar properties. With the property of weak bonding between layers of 2D materials, the growth of III-nitrides on 2D materials has been proposed to solve the mismatch problem caused by heterogeneous epitaxy and to develop substrate stripping techniques to obtain high-quality, low-cost nitride materials for high-quality nitride devices and their extension in the field of flexible devices. In this progress report, the main methods for the preparation of 2D materials, and the recent progress and applications of different techniques for the growth of III-nitrides based on 2D materials are reviewed.
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