Development of a Thin Film Pressure Sensor on a Metallic Substrate
作者
Jackson S. Veiga,Suzana P. Nunes,Gustavo Monteiro da Silva,Luana L. Mattos,Samuel T. da S. Maraschin,Celso Peter,Sandro Binsfeld Ferreira
标识
DOI:10.1109/sbmicro66945.2025.11197760
摘要
Pressure is a fundamental physical variable widely used in different sectors such as the automotive industry, electronic devices, oil and gas, healthcare, manufacturing, and aviation. Accurate measurement and control of this variable is essential for the safe and efficient operation of complex systems, which has driven the commercialization of pressure transmitters due to their wide range of applications. In this work a piezoresistive pressure sensor with an operating range of up to 30 bar was developed and prototyped using microfabrication techniques such as photolithography and sputtering. The sensor demonstrated a sensitivity of $3.35 \text{mV} / \mathrm{V}$, an offset of 192.57 mV, a span of 11.09 mV, a precision of 99.96 %, and a hysteresis of $100 \mu ~\mathrm{V}$. The results showed a performance compatible with commercial sensors, except for the offset, which can be corrected electronically or during calibration.