氮化钽
材料科学
铜
扫描电子显微镜
钽
溅射沉积
涂层
氮化物
冶金
核化学
脉冲直流
复合材料
溅射
图层(电子)
薄膜
化学
纳米技术
作者
T. Elangovan,Athinarayanan Balasankar,Selvaraj Arokiyaraj,R. Ramaseshan,R. P. George,Tae Hwan Oh,P. Kuppusami,Subramaniyan Ramasundaram
出处
期刊:Micromachines
[MDPI AG]
日期:2022-08-27
卷期号:13 (9): 1411-1411
被引量:8
摘要
Highly durable and antimicrobial tantalum nitride/copper (TaN/Cu) nanocomposite coatings were deposited on D-9 stainless steel substrates by pulsed magnetron sputtering. The Cu content in the coating was varied in the range of 1.42–35.42 atomic % (at.%). The coatings were characterized by electron probe microanalyzer, X-ray diffraction, scanning electron microscope and atomic force microscope. The antibacterial properties of the TaN/Cu coatings against gram-negative Pseudomonas aeruginosa were evaluated using a cell culture test. The peak hardness and Young’s modulus of TaN/Cu with 10.46 at.% Cu were 24 and 295 GPa, respectively, which amounted to 15 and 41.67% higher than Cu-free TaN. Among all, TaN/Cu with 10.46 at.% exhibited the lowest friction coefficient. The TaN/Cu coatings exhibited significantly higher antibacterial activity than Cu-free TaN against Pseudomonas aeruginosa. On TaN, the bacterial count was about 4 × 106 CFU, whereas it was dropped to 1.2 × 102 CFU in case of TaN/Cu with 10.46 at.% Cu. The bacterial count was decreased from 9 to 6 when the Cu content increased from 25.54 to 30.04 at.%. Live bacterial cells were observed in the SEM images of TaN, and dead cells were found on TaN/Cu. Overall, TaN/Cu with 10.46 at.% Cu was found to be a potential coating composition in terms of higher antimicrobial activity and mechanical durability.
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