期刊:Journal of Physics D [Institute of Physics] 日期:1978-07-11卷期号:11 (10): 1421-1429被引量:5
标识
DOI:10.1088/0022-3727/11/10/008
摘要
The measurements of low-frequency dielectric dispersion properties of evaporated silicon oxide films under high DC biasing voltage are reported. The results show that the total conductance consists of frequency-dependent and independent parts. The latter part agrees with the differential conductance derived from the DC I-V characteristics and it increases with increasing DC biasing voltage. The former part, which contributes to the relaxation phenomena, decreases with increasing DC biasing voltage. The results of the DC-bias-dependent relaxation phenomena are interpreted by using the two-site hopping model, which is consistent with the results of an electrically excited thermally stimulated current (ETSC) and an absorption current.