薄膜晶体管
同质结
材料科学
光电子学
无定形固体
阈值电压
晶体管
铟
有源矩阵
异质结
电压
电气工程
纳米技术
化学
工程类
有机化学
图层(电子)
作者
Gwanghyeon Baek,Katsumi Abe,Alex Kuo,Hideya Kumomi,Jerzy Kanicki
标识
DOI:10.1109/ted.2011.2168528
摘要
The electrical characteristics and stability of dual-gate (DG) coplanar homojunction amorphous indium-gallium-zinc-oxide thin-film transistors (a-IGZO TFTs) on glass substrates are described herein. In this device structure, both top gate (TG) and bottom gate are defined by lithography, allowing independent biasing when adjacent TFTs are present. The DG a-IGZO TFT demonstrates excellent electrical performance with subthreshold swing (SS) of 99 mV/dec, field-effect mobility of 15.1 , and on- off current ratio of . By applying various bias voltages on the TG electrode, it is found that the TFT threshold voltage can be controlled without any change of the SS and off current. Under conditions of negative bias temperature stress (BTS), the transfer curves of the TFT exhibit negligible shifts after 10 000 s. Larger shifts are observed under conditions of a positive BTS. Finally, the application of this DG device to active-matrix organic light-emitting displays is suggested.
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