量子隧道
铁电性
范德瓦尔斯力
材料科学
凝聚态物理
单层
工作(物理)
隧道枢纽
非易失性存储器
电荷(物理)
光电子学
隧道效应
量子
纳米技术
化学物理
导带
电子能带结构
作者
Shiying He,Shuhong Xie,Daifeng Zou
标识
DOI:10.1088/1361-648x/ae529e
摘要
Abstract Van der Waals ferroelectric tunnel junctions (FTJs) based on two-dimensional (2D) materials offer a promising platform for next-generation nonvolatile memory, yet achieving ultrahigh tunneling electroresistance (TER) remains a critical challenge. This work demonstrates a giant TER effect of 5.83 × 10 9 % in a vertically stacked FTJ comprising out-of-plane ferroelectric monolayers Sc 2 CO 2 and Y 2 CO 2 . First-principles calculations and quantum transport simulations reveal that the TER originates from interfacial work-function engineering. In the P ↓↓ state, a substantial work-function difference (Δ W = 2.35 eV) drives significant charge transfer and yielding high conductance. Conversely, the P ↓↑ configuration exhibits a smaller Δ W (0.85 eV), insufficient to overcome the Sc 2 CO 2 band gap. These findings not only propose Sc 2 CO 2 /Y 2 CO 2 as an exceptional candidate for high-performance memory devices but also establish a general interfacial design strategy for achieving colossal TER in low-dimensional ferroelectric systems.
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