氯
激发态
苯甲酸酯
化学
氯同位素
放射化学
过程(计算)
无机化学
原子物理学
有机化学
物理
操作系统
计算机科学
作者
Kaiheng Guo,Sining Wu,Yuxin Wu,Wenlei Qin,Ruijie Xie,Bolun Zhang,Jingyun Fang
标识
DOI:10.1021/acs.est.5c03024
摘要
Far UV light (UV 222 ) is a promising alternative to traditional 254 nm UV light (UV 254 ) in water treatment, raising great interest in UV 222 -based advanced oxidation processes, particularly UV 222 /chlorine. This study uncovers a novel mechanism for radical generation in UV 222 /chlorine mediated by benzoate (BA), a model compound for benzoate pollutants and moieties of natural organic matter. 10 μM BA significantly enhanced HO • formation and free chlorine decay by 77% and 530% in UV 222 /chlorine, respectively, but showed less effect on UV 254 /chlorine. This enhancement was attributable to an excited-state transformation pathway of BA in UV 222 /chlorine, contributing 64% to BA degradation due to the strong absorption of BA at 222 nm and the high photon energy of UV 222 . The triplet excited state ( 3 BA*) was a key intermediate from BA photoexcitation, followed by the generation of hydrated electrons (e aq – ) via 3 BA* photoionization. Both 3 BA* and e aq – reacted with free chlorine to form HOCl •– at determined rate constants of 1.33 × 10 9 M –1 s –1 and 1.50 × 10 10 M –1 s –1 at pH 7, respectively, and then HOCl •– rapidly decomposed to HO • . Finally, monohydroxylated and dihydroxylated benzoates were produced via the hydrolysis of BA intermediates. This study highlights the critical role of excited benzoates in radical formation and discloses a new abatement mechanism of benzoates in UV 222 /chlorine.
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