材料科学
薄膜晶体管
静电放电
可靠性(半导体)
晶体管
光电子学
计算机科学
电子工程
工程物理
电气工程
纳米技术
工程类
电压
图层(电子)
功率(物理)
物理
量子力学
作者
Yan Yan,Wenrui Lan,Yuankang Chen,Dongbu Yang,Ye Zhou,Zhihua Zhu,Juin J. Liou
标识
DOI:10.1002/aelm.202100886
摘要
Abstract Electrostatic discharge (ESD) is one of the most prevalent threats to the reliability of electronic components, which can result in a very high current passing through the device or microchip within a very short period of time, and cause serious irreversible damage. Thin film transistors (TFTs) are widely used in flat panel display, sensor, memristor, radio frequency identification, and other fields. But unlike the CMOS technology, TFTs can be fabricated in several various processes including amorphous Si, polycrystalline Si, metal oxide, organics, etc. As such, TFTs are prone to different types of reliability issues, and a unified overview on the subject would be beneficial to the electron devices community. The topic of the reliability issues of TFTs in different processes subject to ESD stresses has gained increasing attentions, but the reports and results are scattered. In the review, the existing articles on this topic are summarized. The characterization of TFTs under ESD stress is introduced and the failure mechanisms of various semiconductor based TFTs are compared and analyzed. Optimization methods to improve ESD robustness are presented. Finally, a conclusion and a perspective in the field of research on ESD reliability of TFTs are summarized.
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