硅
扩散
材料科学
载流子寿命
载流子密度
热的
重组
瞬态(计算机编程)
组分(热力学)
光电子学
稳态(化学)
光学
分子物理学
化学物理
化学
兴奋剂
物理
热力学
物理化学
操作系统
基因
生物化学
计算机科学
作者
David H. Hurley,Oliver B. Wright,Osamu Matsuda,Subhash L. Shindé
摘要
We use ultrashort optical pulses to microscopically image carrier and thermal diffusion in two spatial dimensions in pristine and mechanically polished surfaces of crystalline silicon. By decomposing changes in reflectivity in the latter sample into a transient component that varies with delay time and a steady-state component that varies with pump chopping frequency, the influence of thermal diffusion is isolated from that of carrier diffusion and recombination. Additionally, studies using carrier injection density as a parameter are used to clearly identify the carrier recombination pathway.
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