半导体
材料科学
工程物理
半导体器件
热的
电子设备和系统的热管理
宽禁带半导体
带隙
热导率
薄脆饼
纳米技术
工作(物理)
光电子学
机械工程
物理
热力学
工程类
图层(电子)
复合材料
出处
期刊:Chinese Physics
[Science Press]
日期:2021-01-01
卷期号:70 (23): 236502-236502
被引量:7
标识
DOI:10.7498/aps.70.20211662
摘要
The history of semiconductor materials is briefly reviewed in this work. By taking GaN-based high electron mobility transistor as an example, the heat generation mechanisms and thermal management strategies of wide bandgap semiconductor devices are discussed. Moreover, by taking <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> as an example, the thermal management challenges of emerging ultrawide bandgap semiconductors are briefly discussed. The following discussions focus on the interfacial thermal transport which widely exists in the semiconductor devices mentioned above. The recent advancements in room-temperature wafer bonding for thermal management applications are summarized. Furthermore, some open questions about the physical understanding of interfacial thermal transport are also mentioned. Finally, the theoretical models for calculating thermal boundary conductance are reviewed and the challenges and opportunities are pointed out.
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