Influencing Factors of Conditioning Effect about Polishing Pad Conditioning for Chemical Mechanical Polishing

Polishing pad conditioning is one of the most important process for chemical mechanical polishing(CMP).Reasonable conditioning can improve conditioning effect and the quality of polishing.Conditioning effect can be adjusted by changing the dresser's design and conditioning process parameters.The paper expounded the status quo of conditioning polishing pad in CMP,analyzed the influence factors on conditioning effect.It is found that the arrangement of diamond particles affects conditioning efficiency,increase size of particles will promote conditioning efficiency.Conditioning efficiency increases with the increase of conditioning pressure,conditioning time and rotating speed affect conditioning efficiency.Increase conditioning temperature improves the quality of conditioning.Wearing rate of the pad increases with the increase of conditioning density.