环境化学
降级(电信)
硝酸盐
氮气
磺胺甲恶唑
化学
辐照
活性氮物种
活性氮
光化学
活性氧
有机化学
核物理学
抗生素
物理
电信
生物化学
计算机科学
作者
Haoxin Li,Ziyi Li,Ziyi Li,Xi Zhang,Wenjun Sun,Xiuwei Ao,Zifu Li,Zifu Li
标识
DOI:10.1021/acs.est.4c07539
摘要
The application of 222 nm far-UVC irradiation for degrading organic micropollutants in water shows promise. Nitrate (NO3–), found in nearly all water bodies, can significantly impact the performance of 222 nm far-UVC-driven systems. This work was the first to investigate the effect of NO3– on sulfamethoxazole (SMX) photodegradation at 222 nm, finding that NO3– significantly enhances SMX degradation in different dissociated forms. Besides the hydroxyl radical (•OH), reactive nitrogen species (RNS) also played important roles in SMX degradation. With increasing NO3– concentration, the RNS contribution to SMX degradation decreased from 25.7 to 8.6% at pH 3 but increased from 1.5 to 24.7% at pH 7, since the deprotonated SMX with electron-rich groups reacted more easily with RNS. The transformation mechanisms of SMX involving isomerization, bond cleavage, hydroxylation, nitrosation, and nitration processes were proposed. 15N isotope labeling experiments showed that the RNS-induced nitrated products even became the major products of SMX in the 222 nm far-UVC/NO3– system at pH 7 and exhibited a higher toxicity than SMX itself. Further research is necessary to avoid or eliminate these toxic byproducts. This study provides valuable insights for guiding the utilization of 222 nm far-UVC for treating antibiotics in NO3–-containing water.
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