等离子体增强化学气相沉积
材料科学
无定形碳
真空电弧
碳膜
化学气相沉积
无定形固体
热稳定性
透射电子显微镜
退火(玻璃)
阴极电弧沉积
氢
分析化学(期刊)
化学工程
薄膜
阴极保护
等离子体
复合材料
纳米技术
化学
结晶学
电极
有机化学
阳极
物理
工程类
物理化学
量子力学
作者
Jun Xie,K. Komvopoulos
标识
DOI:10.1080/14786435.2017.1282180
摘要
Ultrathin hydrogenated amorphous carbon (a-C:H) films deposited by plasma-enhanced chemical vapor deposition (PECVD) and hydrogen-free amorphous carbon (a-C) films of similar thickness deposited by filtered cathodic vacuum arc (FCVA) were subjected to rapid thermal annealing (RTA). Cross-sectional transmission electron microscopy (TEM) and electron energy loss spectroscopy (EELS) were used to study the structural stability of the films. While RTA increased the thickness of the intermixing layer and decreased the sp3 content of the a-C:H films, it did not affect the thickness or the sp3 content of the a-C films. The superior structural stability of the FCVA a-C films compared with PECVD a-C:H films, demonstrated by the TEM and EELS results of this study, illustrates the high potential of these films as protective overcoats in applications where rapid heating is critical to the device functionality and performance, such as heat-assisted magnetic recording.
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