带隙
材料科学
化学工程
工程物理
纳米技术
光电子学
物理
工程类
作者
Wen He,Jia Shi,Hong-Kang Zhao,Hui Wang,Xinfeng Liu,Xinghua Shi
出处
期刊:RSC Advances
[Royal Society of Chemistry]
日期:2020-01-01
卷期号:10 (27): 15702-15706
被引量:17
摘要
with a low bulk concentration (around 5%) of S vacancies. This is different from most reported results about transition metal dichalcogenide (TMD) materials that the indirect band gap decreases as the number of layers increases and the low concentrations of vacancies show negligible influence on the band gap value.
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