Construction of Cu-bridged Cu2O/MIL(Fe/Cu) catalyst with enhanced interfacial contact for the synergistic photo-Fenton degradation of thiacloprid

催化作用 氧化还原 光催化 激进的 化学 降级(电信) 电子顺磁共振 光化学 矿化(土壤科学) 复合数 化学工程 核化学 无机化学 材料科学 有机化学 氮气 复合材料 电信 计算机科学 工程类 物理 核磁共振
作者
Zhen Zhong,Min Li,Jinghao Fu,Yuexin Wang,Yaseen Muhammad,Sihan Li,Jiaxing Wang,Zhongxing Zhao,Zhenxia Zhao
出处
期刊:Chemical Engineering Journal [Elsevier BV]
卷期号:395: 125184-125184 被引量:118
标识
DOI:10.1016/j.cej.2020.125184
摘要

Abstract Cu2O/MIL(Fe/Cu) composite was fabricated via an in-situ Cu-bridging strategy to enhance interfacial synergistic effect of photo-Fenton catalysis for thiacloprid (TCL) degradation. Characterization results showed that: (1) Cu2O was proved to grow on the surface of MIL(Fe/Cu) in Cu2O/MIL(Fe/Cu) composite and display a high BET surface area of 1553 m2/g; (2) Cu2O/MIL(Fe/Cu) reduced band gap from 2.5 to 1.3 eV and extended absorption from UV to visible region; (3) Cu-bridge was proved to promote the intimate interface between Cu2O and MIL(Fe/Cu), which accelerated charge transferred and shortened the binding gap and the reaction pathway from photo-induced electrons to Fenton-generated radicals. As a result, this boosted the redox reaction of Fe2+/Fe3+ and promoted the reversible degree of this catalytic redox ability of MIL(Fe). Catalytic performance exhibited that (1) Cu2O/MIL(Fe/Cu) showed a fast kinetics (2–40 times faster than the state-of-the-art catalysts) and ultra-high mineralization (82.3% within 80 min) for TCL degradation; (2) Cu2O/MIL(Fe/Cu) showed a promising cycling stability due to improved charge transfer ability that could protect Cu2O from photo-corrosion during photo-Fenton reaction; (3) The catalytic performance of Cu2O/MIL(Fe/Cu) was characterized and seven photocatalytic intermediates were identified by both HPLC/MS and Surface Enhanced Raman Spectroscopy. The cyanoimino group in TCL was proved for the first time to be attacked primarily. Moreover, among all the detected intermediates, thiazolidin-2-amine (P6) was found to be the most stable intermediate to be degraded, and it can directly influence the TOC determination during photodegradation process.
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