沟槽
材料科学
MOSFET
光电子学
宽禁带半导体
碳化硅
工程物理
氮化镓
电气工程
电子工程
电压
晶体管
纳米技术
复合材料
工程类
图层(电子)
作者
Jialun Li,Renqiang Zhu,Ka Ming Wong,Kei May Lau
标识
DOI:10.1109/led.2024.3520200
摘要
This letter presents the first demonstration of fully-vertical GaN-on-SiC trench MOSFETs enabled by a conductive AlGaN buffer. Good ON-state device performance including a maximum drain current density of 2.43 kA/cm2 and a high threshold voltage of 5 V has been demonstrated. The relatively high specific ON-resistance at low VDS is a result of a knee voltage induced by the yet to be optimized AlGaN/SiC heterojunction. A breakdown voltage of 334 V has been measured. Compared with quasi-vertical GaN-on-silicon trench MOSFETs, less current crowding effect is observed for fully-vertical GaN-on-SiC trench MOSFETs, as well as a better performance at elevated temperatures.
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