纳米器件
光学
材料科学
表征(材料科学)
显微镜
极化(电化学)
全内反射
显微镜
薄膜
度量(数据仓库)
制作
半导体
计算机科学
光电子学
纳米技术
物理
化学
数据挖掘
物理化学
病理
替代医学
医学
作者
Zhaolou Cao,Yunyun Chen,Fenglin Xian,Haidong Ren,Bing Tu
出处
期刊:Optics Letters
[Optica Publishing Group]
日期:2024-01-02
卷期号:49 (3): 598-598
被引量:1
摘要
Thin film characterization is a necessary step in the semiconductor industry and nanodevice fabrication. In this work, we report a learning-assisted method to conduct the measurement based on a multi-angle polarized microscopy. By illuminating the film with a tightly focused vectorial beam with space-polarization nonseparability, the angle-dependent reflection coefficients are encoded into the reflected intensity distribution. The measurement is then transformed into an optimization problem aiming at minimizing the discrepancy between measured and simulated image features. The proposed approach is validated by numerical simulation and experimental measurements. As the method can be easily implemented with a conventional microscope, it provides a low cost solution to measure film parameters with a high spatial resolution and time efficiency.
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