高功率脉冲磁控溅射
氮化铬
材料科学
涂层
溅射沉积
物理气相沉积
腔磁控管
微观结构
溅射
冶金
直流电
光电子学
氮化物
工程物理
薄膜
复合材料
纳米技术
图层(电子)
电气工程
电压
工程类
作者
Heda Bai,Jin Li,Jialai Gao,Jinyang Ni,Yaxiong Bai,Jie Jian,Lin Zhao,Bowen Bai,Zeyun Cai,Jianchao He,Hongsheng Chen,Xuesong Leng,Xiangli Liu
出处
期刊:Materials
[Multidisciplinary Digital Publishing Institute]
日期:2023-09-20
卷期号:16 (18): 6303-6303
被引量:32
摘要
Chromium Nitride (CrN) coatings have widespread utilization across numerous industrial applications, primarily attributed to their excellent properties. Among the different methods for CrN coating synthesis, direct current magnetron sputtering (DCMS) has been the dominant technique applied. Nonetheless, with the expanded applications of CrN coatings, the need for enhanced mechanical performance is concurrently escalating. High-power impulse magnetron sputtering (HiPIMS), an innovative coating deposition approach developed over the past three decades, is gaining recognition for its capability of yielding coatings with superior mechanical attributes, thereby drawing significant research interest. Considering that the mechanical performance of a coating is fundamentally governed by its microstructural properties, a comprehensive review of CrN coatings fabricated through both techniques is presented. This review of recent literature aims to embark on an insightful comparison between DCMS and HiPIMS, followed by an examination of the microstructure of CrN coatings fabricated via both techniques. Furthermore, the exploration of the underlying factors contributing to the disparities in mechanical properties observed in CrN coatings is revealed. An assessment of the advantages and potential shortcomings of HiPIMS is discussed, offering insight into CrN coating fabrication.
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