Fabrication of Highly ordered pore arrays by soft nanoimprint lithography
作者
Yongsheng Shi,Hongzhong Liu,Yucheng Ding,Bingheng Lu,Duowang Fan
标识
DOI：10.1109/inow.2007.4302991
摘要
A soft nano-imprint lithography (NIL) technology is approached to fabricate the pore arrays nanostructures. Experimental results reveal that the proposed process can fabricate highly ordered pore arrays with a low cost.
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(2025-6-4)
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