Growth Conditions, Optical and Dielectric Properties of Yttrium Oxide Thin Films

Thin Y2O3 films are grown by reactive synthesis, their optical and dielectric properties (electric resistivity, dielectric losses and permittivity, electric strength, and refractive index) are measured. Their dependence upon deposition parameters (deposition rate and reactive gas pressure) is investigated. Comparison of experimental data with those obtained by film growth modelling by the Monte-Carlo method suggests an insignificant influence of diffusion jumps and long-range order on the formation of Y2O3 films at low deposition temperature (300 to 400 K). The perspectives of Y2O3 films as dielectric layers in integrated circuits and high refractive layers for laser mirrors are shown.