脱羧
化学
氧化物
羧酸
金属
光化学
离子键合
辐照
激进的
紫外线
有机化学
离子
催化作用
材料科学
核物理学
物理
光电子学
作者
Tomoe Otsuka,Yusa Muroya,Takuya Ikeda,Yoshitaka Komuro,Daisuke Kawana,Takahiro Kozawa
标识
DOI:10.35848/1347-4065/ac4b43
摘要
Abstract Metal oxide nanocluster resists have recently attracted considerable attention for use in extreme ultraviolet lithography. To obtain sophisticated guidelines for material design, it is necessary to understand well the radiation-induced chemical reaction scheme including the insolubilization mechanism. In this study, the production of CO 2 , which is considered to be one of the end products of treatment with an ionizing radiation, was investigated for eight types of carboxylic acid under various conditions using γ -rays ( 60 Co) as a radiation source. The amount of CO 2 produced was measured by gas chromatography. G CO2 (/100 eV), which indicates decarboxylation efficiency, was evaluated. CO 2 was generated through electron addition, hole transfer, and hydroxyl radical addition to the molecular and ionic forms of carboxylic acids. The dependences of G CO2 on reaction partners were clarified. The dependences of G CO2 on the molecular structure and dissociative state of carboxylic acids were also clarified.
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