材料科学
热离子发射
电场
饱和(图论)
电镀(地质)
过程(计算)
铬
氧化物
扩散
热的
冶金
化学工程
分析化学(期刊)
热力学
环境化学
物理
数学
电子
地质学
操作系统
组合数学
化学
量子力学
工程类
计算机科学
地球物理学
标识
DOI:10.1134/s2075113324700503
摘要
Abstract—The emergence of a thermionic field in a process mixture under thermal diffusion chromium plating has been established. It has been shown that some oxide compounds contained in a process mixture participate actively in the emission process. A cell for measuring emission currents and the temperature of their occurrence upon heating has been designed. The contribution of the electric emission field upon saturation of parts during thermochemical treatment has been determined in comparison with the contribution of the concentration field.
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