薄膜晶体管
材料科学
光电子学
阈值电压
氧化铟锡
晶体管
频道(广播)
氧化物
阈下摆动
纳米尺度
纳米技术
纳米-
电压
电气工程
薄膜
图层(电子)
冶金
工程类
复合材料
作者
Dengqin Xu,minghe zhang,rui bin duan,Yi Wang,Dedong Han,Lifeng Liu,Xing Zhang
标识
DOI:10.35848/1347-4065/ad1254
摘要
Abstract Nanoscale short-channel oxide thin film transistors (TFTs) have attracted widespread research interest due to their potential applications in advanced display and memory devices. In this work, we fabricate indium-tin-oxide (ITO) TFTs with a series of channel lengths ranging from 10μm to 150nm. And through optimized process we successfully fabricate 130-nm channel length high performance ITO TFTs with an on-state current of 93 (μA/μm), a subthreshold swing (SS) of 102 (mV/decade) and on/off ratio over 107 at drain voltage of 3 V.
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