双模
电子
氩
原子物理学
吸收(声学)
模式(计算机接口)
对偶(语法数字)
功率(物理)
动力学(音乐)
材料科学
物理
光学
声学
核物理学
电子工程
量子力学
工程类
操作系统
艺术
计算机科学
文学类
作者
Yang Zhou,Kai Zhao,Fang-Fang Ma,Jing‐Yu Sun,Yong-Xin Liu,Fei Gao,Yu‐Ru Zhang,You‐Nian Wang
标识
DOI:10.1088/1361-6595/adc331
摘要
Abstract Dual-frequency capacitively coupled plasmas driven by a low frequency less than 1 MHz have recently received growing attention due to their ability to produce higher ion energy, narrower energy spread, and enhanced ion flux (Zhou et al 2024 Appl. Phys. Lett. 124 064102). Here, the dependences of the charged particle dynamics and electron power absorption mode on the low-frequency (LF) voltage amplitude ( V L ), high-frequency (HF) voltage amplitude ( V H ), and gas pressure (p) in 400 kHz/27.2 MHz DF capacitively coupled argon discharges have been investigated by experimental diagnostics and particle-in-cell/Monte Carlo collision simulations. A hairpin probe is used to measure the plasma density ( n e ) at the discharge center, while phase-resolved optical emission spectroscopy allows for the measurements of the time- and space-averaged optical emission intensity at 750.4 nm ( I 750 , ave ) and the spatiotemporally resolved electron-impact excitation rate. Compared to a single-frequency 27.2 MHz discharge, the addition of the LF source is found to significantly affect the electron-impact excitation/ionization dynamics via frequency coupling and secondary electron emission. At p = 40 Pa and V H = 225 V, both n e and I 750 , ave experience a moderate decline followed by a dramatic rise with the increase of V L , corresponding to an electron power absorption transition from α-mode to a hybrid α-γ-mode. The decline in n e and I 750 , ave versus V L at V L < 300 V is caused by a reduced bulk electron power deposition and a stronger frequency coupling effect at a higher
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