电介质
制作
电容器
材料科学
三元运算
薄膜
储能
薄脆饼
高-κ电介质
铁电性
光电子学
涂层
硅
纳米技术
电气工程
电压
计算机科学
工程类
物理
病理
功率(物理)
医学
程序设计语言
替代医学
量子力学
作者
Panpan Lv,Jin Qian,Changhong Yang,Yuwen Wang,Wenwen Wang,Shifeng Huang,Xin Cheng,Zhenxiang Cheng
出处
期刊:ACS energy letters
[American Chemical Society]
日期:2021-10-13
卷期号:6 (11): 3873-3881
被引量:57
标识
DOI:10.1021/acsenergylett.1c02017
摘要
BiFeO3–BaTiO3 is a promising base for developing high energy density capacitors. However, no reports have been available on fabrication of binary or even ternary BiFeO3–BaTiO3 based solid solution films via a chemical solution route since Ba2+ and Bi3+ are incompatible. Here, we developed a chemical route via alternative coating layers of relaxor ferroelectric 0.4BiFeO3-0.6SrTiO3 and paraelectric Ba0.5Sr0.5TiO3 to realize a BiFeO3–BaTiO3–SrTiO3 film with the assistance of element interface diffusion. A remarkably improved energy density of 98 J cm–3 and a high efficiency of 80% are obtained in the film with optimized layer thickness because of its large dielectric constant, high breakdown strength, and strong relaxor behavior. Of particular interest, the fabrication technique allows deposition of film over an entire 4-in. silicon wafer with good uniformity and comparable energy-storage performance. The strategy can be applicable for fabrication of large-area dielectric or other films with incompatible elements in their precursor solution.
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