绝缘体上的硅
散射
材料科学
光学
光刻
波导管
表面粗糙度
硅
表面光洁度
电子束光刻
山脊
光电子学
抵抗
物理
复合材料
古生物学
生物
图层(电子)
作者
Kuan Pei Yap,Andre Delage,J. Lapointe,B. Lamontagne,Jens H. Schmid,Philip D. Waldron,Barry A. Syrett,Siegfried Janz
标识
DOI:10.1109/jlt.2009.2021562
摘要
We use star couplers to measure the relative scattering losses of silicon-on-insulator (SOI) ridge waveguides of various widths over the range of 1.75 to 0.2 mum in a single measurement. The scattering loss data obtained for waveguides fabricated by different photolithography and e-beam base processes correlate well with the measured root-mean-square roughness of the waveguide sidewalls obtained using SEM image analysis, and are in qualitative agreement with the prediction of simple scattering loss theory.
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