Pattern-Integrated Interference Lithography for 2D and 3D Photonic Crystals
作者
Thomas K. Gaylord,Matthieu C. R. Leibovici
标识
DOI：10.1364/fio.2013.fth2f.1
摘要
Pattern-Integrated Interference Lithography (PIIL) couples interference lithography and imaging lithography to produce periodic microstructures with integrated functional elements in a single-exposure step. In this work, 2D-PIIL is reviewed and 3D-PIIL is simulated.
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(2025-6-4)
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