材料科学
基质(水族馆)
太阳能电池
光电子学
外延
蚀刻(微加工)
降级(电信)
纳米技术
图层(电子)
电子工程
地质学
海洋学
工程类
作者
Kevin L. Schulte,Steve Johnston,Anna K. Braun,Jacob T. Boyer,Anica N. Neumann,William E. McMahon,Michelle Young,Pablo Guimerá Coll,Mariana I. Bertoni,Emily L. Warren,Myles A. Steiner
出处
期刊:Joule
[Elsevier BV]
日期:2023-07-01
卷期号:7 (7): 1529-1542
被引量:8
标识
DOI:10.1016/j.joule.2023.05.019
摘要
Summary
Acoustic spalling presents a potentially low-cost reuse pathway for III–V epitaxial growth substrates via exfoliation of device layers with recovery and reuse of the substrate. However, surface features formed during spalling can reduce the performance of subsequently grown devices. We develop an understanding of how the surface morphology of acoustically spalled substrates affects GaAs solar cell performance and develop strategies to mitigate these impacts. We demonstrate that minor planarization of the surface by wet chemical etching and/or epitaxial growth, or the redesign of the device structure to thicken critical layers, prevents performance degradation. Using these strategies, we demonstrate a 0.25 cm2 single-junction GaAs device with 26.9% ± 0.2% photovoltaic conversion efficiency under the AM1.5G spectrum grown on an acoustically spalled substrate. These results enable the growth of high-performance III–V devices on non-traditional substrates with the potential for significantly reduced device costs.
科研通智能强力驱动
Strongly Powered by AbleSci AI