Design Space Exploration of Interconnect Materials for Cryogenic Operation: Electrical and Thermal Analyses

With Copper (Cu) Interconnects causing performance bottleneck at single nanometer nodes due to increase in resistivity size effects viz., grain boundary scattering and surface scattering, there has always been scavenging for alternate interconnect materials. Although the Cu resistivity value decreases at cryogenic temperature, the problems continue to persist. In this work, we study three alternate interconnect materials specifically for 77K High Performance Compute applications. We select the materials based on their resistivity value at 77K for 7nm node computed using Fuchs-Sondheimer-Mayadas-Shatzkes (FS-MS) models. We analyze the delay of the interconnects, understand repeater insertion as a function of wire length, evaluate repeater count and energy at system level and perform IR drop analysis by showing through detailed analytical models that Ru, Rh and Al can provide appreciable improvements over Cu at 77K. The delay of interconnects reduces by 1-3.75% for Ru, 1.5-7.25% for Rh and 4.4-17.8% for Al across the BEOL stack while repeater counts decrease by 10%, 15% and 37% for Ru, Rh and Al respectively at 77K. We investigate thermal and reliability aspects of interconnect design including electromigration, Joule Heating and maximum allowed current densities again proving that Ru (9%), Rh (18%) and Al (63%) outperform Cu at 77K. Finally, we study the effects of various Low-k dielectric materials on the interconnect capacitance and thermal behavior for Cu as well as three alternate materials noting that, even though thermal conductivity of dielectrics decrease at 77K, the Joule Heating will not be as worse as one might expect.