Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

光子学 平版印刷术 纳米技术 材料科学 微流控 3D打印 光电子学 复合材料
作者
Hao Wang,Wang Zhang,Dimitra Ladika,Haoyi Yu,Darius Gailevičius,Hongtao Wang,Chengfeng Pan,Parvathi Nair Suseela Nair,Yujie Ke,Tomohiro Mori,John You En Chan,Qifeng Ruan,Maria Farsari,Mangirdas Malinauskas,Saulius Juodkazis,Miṅ Gu,Joel K. W. Yang
出处
期刊:Advanced Functional Materials [Wiley]
卷期号:33 (39) 被引量:164
标识
DOI:10.1002/adfm.202214211
摘要

Abstract The rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced 3D printing techniques, two‐photon polymerization lithography (TPL) uniquely offers a significant advantage in nanoscale print resolution, and has been widely employed in diverse fields, for example, life sciences, materials sciences, mechanics, and microfluidics. More recently, by virtue of the optical transparency of most of the resins used, TPL is finding new applications in optics and photonics, with nanometer to millimeter feature dimensions. It enables the minimization of optical elements and systems, and exploration of light‐matter interactions with new degrees of freedom, never possible before. To review the recent progress in the TPL related optical research, it starts with the fundamentals of TPL and material formulation, then discusses novel fabrication methods, and a wide range of optical applications. These applications notably include diffractive, topological, quantum, and color optics. With a panoramic view of the development, it is concluded with insights and perspectives of the future development of TPL and related potential optical applications.
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