Simulation, Deposition, and Characterization of WO3 and Multilayered WO3/Ag Thin Film Structure for Smart Window Applications

Tungsten oxide (WO3) and multilayered Tungsten oxide-silver (WO3/Ag) Thin layers were simulated and deposited for an electrochromic perspective of smart window applications. The simulation of the device was carried out to perform cyclic voltammetry analysis. Further, the thin films were experimentally deposited using DC Magnetron Sputtering on an FTO Glass substrate and were characterized using an optical profilometer for thickness determination, and Cyclic voltammetry for I-V relation analysis. The goal of this work is to carry out a comparative analysis of single-layer and multilayered-layer performance for electrochromic applications. On the application of potential from -0.7 V to 1 V and a scan rate of 10mV/s, the single layer produced a cathodic current of –6.8 mA whereas the multilayer could produce -7.36 mA, Hence It is found that both simulated and Experimental results show that the multilayered deposition of WO3/Ag provides improved current than the single layer.