电迁移
材料科学
记忆电阻器
空位缺陷
氧气
凝聚态物理
纳米技术
电子工程
复合材料
物理
量子力学
工程类
作者
Rodrigo Leal Martir,M. J. Sánchez,Myriam H. Aguirre,Walter Quiñonez,Cristian Ferreyra,C. Acha,Jerome Lecourt,Ulrike Lüders,D. Rubi
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2022-11-24
卷期号:34 (9): 095202-095202
被引量:5
标识
DOI:10.1088/1361-6528/aca597
摘要
Abstract Memristors are expected to be one of the key building blocks for the development of new bio-inspired nanoelectronics. Memristive effects in transition metal oxides are usually linked to the electromigration at the nanoscale of charged oxygen vacancies (OV). In this paper we address, for Pt/TiO x /TaO y /Pt devices, the exchange of OV between the device and the environment upon the application of electrical stress. From a combination of experiments and theoretical simulations we determine that both TiO x and TaO y layers oxidize, via environmental oxygen uptake, during the electroforming process. Once the memristive effect is stabilized (post-forming behavior) our results suggest that oxygen exchange with the environment is suppressed and the OV dynamics that drives the memristive behavior is restricted to an internal electromigration between TiO x and TaO y layers. Our work provides relevant information for the design of reliable binary oxide memristive devices.
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