The Effect of Sputtering Conditions on the Electrochromic Properties of Titanium Oxide Thin Films

Titanium oxide () films are deposited on the indium tin oxide (ITO) substrate in an atmosphere by using reactive RF (Radio Frequency) magnetron sputtering technique, and Electrochromic properties and durability of films deposited at different preparation conditions are investigated by using UV-VIS spectrophotometer and cyclic voltammetry Li+ interalation/deintercalation in films shows that the electrochromic properties and durability of as-deposited films strongly depend on gas pressure films formed in our sputtering conditions are found to remain transparent, irrespective of their Li+ ion contents. The optimum sputtering conditions for film as passive counter electrode in electrochromic devices are working pressure of and oxygen flow raes of , respectively