Toward the Next Generation of Permanently Porous Materials: Halogen-Bonded Organic Frameworks

晶体工程 超分子化学 卤键 合成子 多孔性 纳米技术 材料科学 卤素 氢键 化学 分子 结晶学 晶体结构 有机化学 复合材料 烷基
作者
Michael P. Moghadasnia,Brian J. Eckstein,Hannah R. Martin,Jesus U. Paredes,C. Michael McGuirk
出处
期刊:Crystal Growth & Design [American Chemical Society]
卷期号:24 (6): 2304-2321 被引量:29
标识
DOI:10.1021/acs.cgd.3c01427
摘要

Halogen bonding has emerged as a reliable and intuitive handle in crystal engineering, providing predictable, noncovalent interactions capable of directing supramolecular assembly into networks with varying degrees of dimensionality. Conceptually similar to hydrogen bonding, halogen bonding represents a virtually untapped space for realizing new low-density porous architectures with large, highly crystalline domains. With the foundational understanding gained from almost two decades of computational and empirical supramolecular investigations, we believe that halogen bonding is on the precipice of enabling a new class of noncovalently linked permanently porous materials, aptly called halogen-bonded organic frameworks (XOFs). This perspective focuses on defining the criteria for the classification of XOFs and highlights seminal works in both halogen and hydrogen bonding that play an integral role toward understanding the key strategies in both synthon and tecton design that will lead to assembly of materials with accessible void space and observable porosity. Finally, solvent activation procedures and desorption mechanisms are discussed toward the goal of achieving permanently porous frameworks and thrusting halogen bonding into the realm of porous materials.
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