材料科学
可靠性(半导体)
压力(语言学)
薄膜晶体管
氧化铟锡
铟
锌
宽禁带半导体
光电子学
锡
晶体管
电压
氧化物
锌化合物
薄膜
电子工程
冶金
电气工程
复合材料
纳米技术
图层(电子)
工程类
功率(物理)
哲学
物理
量子力学
语言学
作者
Guanming Zhu,Zhiying Chen,Meng Zhang,Lei Lü,Sunbin Deng,Man Wong,Hoi Sing Kwok
摘要
In this Letter, the reliability of indium-tin-zinc-oxide thin-film transistors (TFTs) under dynamic drain voltage stress is investigated. A degradation phenomenon, associated with both pulse rising time (tr) and falling time, is observed. Through the technology computer-aided design simulation and recovery experiment, it is discovered that the tr-dependent dynamic hot carrier effect and integral voltage-dependent electron detrapping jointly affect the device's reliability. Finally, an AC degradation model in indium-tin-zinc oxide TFTs, considering the non-equilibrium junction, hot carrier injection, and recovery, was proposed.
科研通智能强力驱动
Strongly Powered by AbleSci AI