Ferroelectric memristor based on Li-doped BiFeO3 for information processing

As a nanoscale semiconductor memory device, a ferroelectric memristor has promising prospects to break through the von Neumann framework in terms of artificial synaptic function, information processing, and integration. This study presents the fabrication of Li0.09Bi0.91FeO3 as the functional layer for a memristor device based on the Si substrate, enabling the integration of silicon complementary metal oxide semiconductor technology. In addition, it exhibits bipolar resistance switching characteristics in a direct current mode and can rapidly achieve stable conductance tunability at higher frequencies through the applied pulse for biosynapse simulation. More importantly, multiple devices are connected into electrical circuits to realize storage functions with information processing and programmable characteristics. This work paves the way for near-future applications of ferroelectric memristors in information processing.