Polishing slurry chemical formulation design driven by large language models

The polishing slurry is an essential part of chemical mechanical planarisation (CMP); many research papers and patents have been published on its multiple forms, structures, and related mechanisms. This paper leverages the natural language processing capability of large language models (LLMs) to extract information from more than 30,000 literature summaries and over 4,800 patent applications, building a domain knowledge system with approximately 77,000 nodes and 100,000 links. On this basis, an integrated knowledge graph for the polishing slurry domain was constructed.