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Effect of α-methyl on the performance of photocurable 3D printing polyurethane materials

稀释剂 聚氨酯 预聚物 丙烯酸酯 材料科学 动力学 高分子化学 化学工程 甲基丙烯酸甲酯 化学 复合材料 有机化学 聚合物 共聚物 工程类 物理 量子力学
作者
Jianhua Fei,Xia Du,Youjie Rong,Lisheng Zhu,Xiaomin Zhang,Huijie Li,Xiaoxia Lu,Xiaobo Huang
出处
期刊:Journal of Chemical Physics [American Institute of Physics]
卷期号:159 (23) 被引量:2
标识
DOI:10.1063/5.0175616
摘要

For photosensitive polyurethane systems, reactive diluents are indispensable components whose main role is to reduce the viscosity of the polyurethane prepolymer to meet the requirements of the photocurable 3D printing technology for high fluidity of the precursor solution. Generally, the reactive diluent would be involved in the photocuring reaction, which in turn has a remarkable impact on the mechanical, reaction kinetics, and thermodynamic characteristics of the photosensitive polyurethane system. However, this feature is usually neglected in the study of photosensitive urethane acrylate (PUA) systems, so there is a considerable necessity to investigate the mechanism of active diluents in the photocured reaction of PUA systems. In this work, the effects of α-methyl groups along the chains of diluent molecules on the photoreaction kinetics, photocurable 3D printing, mechanical and mechanical properties, and thermodynamic characteristics of PUAs were investigated employing hydroxyethyl methacrylate and hydroxyethyl acrylate as active diluents, respectively. The relationship between chemical structure and kinetics of PUA systems was also elucidated by using dynamic mechanical analysis tests. The results demonstrated that the α-methyl group blocks the migration of reactive radicals, reduces the efficiency of the photoreaction, and causes an increase in the rigidity and strength of the molecular chain. This study not only revealed the effect of α-methyl on the kinetic mechanical and thermal performance of PUA systems but also paves the way for the development of a new class of photosensitive PUA materials used for the photocurable 3D printing technology.
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