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Selective removal of Hg(II) by UiO-66-NH2 modified by 4-quinolinecarboxaldehyde: from experiment to mechanism

吸附 X射线光电子能谱 朗缪尔吸附模型 Zeta电位 化学 吸热过程 物理吸附 傅里叶变换红外光谱 单层 核化学 化学工程 无机化学 物理化学 生物化学 工程类 纳米颗粒
作者
Yuting Hu,Shixing Wang,Libo Zhang,Fan Yang
出处
期刊:Environmental Science and Pollution Research [Springer Science+Business Media]
卷期号:30 (1): 2283-2297 被引量:4
标识
DOI:10.1007/s11356-022-22276-6
摘要

In wastewater, heavy metal Hg causes serious harm to ecology, so it needs to be removed. In this paper, a novel MOF adsorbent (UiO-66-QU) was prepared by modifying UiO-66-NH2 with 4-quinolinecarboxaldehyde, which was used to selectively remove Hg(II) from water. The adsorbent was characterized using Fourier transform infrared spectroscopy (FT-IR), field emission scanning electron microscopy (SEM), Brunauer–Emmett–Teller (BET), zeta potentiometer, and X-ray photoelectron spectroscopy (XPS). In order to investigate the Hg(II) adsorption performance of UiO-66-QU, the effect of time, initial concentration, pH, and temperature were carried out. Langmuir model fitting shows that the maximum adsorption capacity of UiO-66-QU for Hg(II) is 556 mg/g at 298 K. The experimental results show that UiO-66-QU has better Hg(II) adsorption capacity than UiO-66-NH2. The isotherm is in accordance with pseudo-second-order models. It is indicated that the adsorption process is mainly monolayer chemical adsorption. The thermodynamic parameters also indicate that the adsorption process is spontaneous and endothermic. It has excellent reusability and selectivity. XPS and the zeta potential showed that the adsorption mechanism was the complex reaction of Hg(II) with nitrogenous group. Therefore, the adsorbent has potential application prospects in removal of Hg(II) from wastewater.
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