Research of the collection efficiency of collectors for EUV source

The collector for EUV source is one of the most important parts in EUV lithography system, which determines whether the whole EUV lithography can be used or not. Collection efficiency is the most important performance parameter and start point when designing a collector for EUV source. The main purpose of this research is to give the optical designers deep acquaintance with Wolter I collector and the designing direction. The collection efficiency with the approximate format of one mirror shell and whole collector in the most promising EUV collector-Wotler I collector is worked out and discussed in this paper. There is also the effect of collection efficiency and detailed processes when it acts the direction in the designing of Wolter I collector.