A novel approach to dual damascene patterning

In this paper, we present and discuss a novel approach to dual damascene patterning based on the invention of SLAM (Sacrificial Light Absorbing Material). We will focus on dual damascene patterning problems that led to the invention of SLAM, and present a side-by-side comparison of the patterning performance of SLAM-assisted dual damascene patterning and a Bottom Anti-Reflective Coating (BARC), the industry's primary approach. SLAM-assisted dual damascene patterning is an enabling technology for Intel's 130 nm technology and beyond.