溅射
材料科学
结晶度
非阻塞I/O
溅射沉积
薄膜
光电子学
电阻率和电导率
复合材料
纳米技术
化学
电气工程
生物化学
工程类
催化作用
作者
A. Mallikarjuna Reddy,A. Sivasankar Reddy,Kee-Sun Lee,P. Sreedhara Reddy
标识
DOI:10.1016/j.solidstatesciences.2010.11.019
摘要
Cubic nickel oxide (bunsenite) films were deposited on glass substrates by dc reactive magnetron sputtering technique at different sputtering powers. The influence of sputtering power on structural, compositional, optical, and electrical properties of the as deposited films were investigated. The XRD results revealed that the orientation of the NiO films was changed from (200) to (220) with increasing the sputtering power. The crystallinity of the films was also increased with sputtering power. The optical transmittance of NiO films in the visible spectrum was increased up to a sputtering power of 150 W and then decreased slightly at higher sputtering powers. The low electrical resistivity the NiO films was about 5.1 Ω cm at a sputtering power of 150 W.
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